Volume 16 (2025)
Volume 15 (2024)
Volume 14 (2023)
Volume 13 (2022)
Volume 12 (2021)
Volume 11 (2020)
Volume 10 (2019)
Volume 9 (2018)
Volume 8 (2017)
Volume 7 (2016)
Volume 6 (2015)
Volume 5 (2014)
Volume 4 (2013)
Volume 3 ( 2012)
Volume 2 (2011)
Volume 1 (2010)
The effect of growth time and oxygen flow on the properties of electrochromic WO3 thin layers grown by LPCVD 

D. Louloudakis; D. Vernardou; G. Papadimitropoulos; D. Davazoglou; E. Koudoumas

Volume 9, Issue 8 , August 2018, , Pages 578-584

https://doi.org/10.5185/amlett.2018.2013

Abstract
  Results are presented regarding the development of functional electrochromic WO3 thin layers, using a simple, one step and fast process without the need of template or seed layers or even post-annealing, factors favoring large scale industrial deposition. In particular, low-pressure chemical vapor deposition ...  Read More

The effect of growth time and oxygen flow on the properties of electrochromic WO3 thin layers grown by LPCVD 


Effect of deposition temperature on the electrochromic properties of WO3 grown by LPCVD

D. Louloudakis; D. Davazoglou;E. Koudoumas; D. Vernardou; G. Papadimitropoulos

Volume 9, Issue 3 , March 2018, , Pages 192-198

https://doi.org/10.5185/amlett.2018.1823

Abstract
  Monoclinic electrochromic tungsten trioxide (WO3) layers were grown on FTO substrates using a Low-Pressure Chemical Vapor Deposition (LPCVD) system. The effect of the deposition temperature on the structural and morphological characteristics as well as the electrochromic response of the layers was examined. ...  Read More

Effect of deposition temperature on the electrochromic properties of WO3 grown by LPCVD