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Effect of deposition temperature on the electrochromic properties of WO3 grown by LPCVD

    D. Louloudakis D. Davazoglou;E. Koudoumas D. Vernardou G. Papadimitropoulos

Advanced Materials Letters, 2018, Volume 9, Issue 3, Pages 192-198
10.5185/amlett.2018.1823

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Abstract

Monoclinic electrochromic tungsten trioxide (WO3) layers were grown on FTO substrates using a Low-Pressure Chemical Vapor Deposition (LPCVD) system. The effect of the deposition temperature on the structural and morphological characteristics as well as the electrochromic response of the layers was examined. It was found that increasing deposition temperature improves the crystallinity of the layers which affects their electrochemical/electrochromic behavior. 
Keywords:
    LPCVD tungsten trioxide electrochromic response
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(2018). Effect of deposition temperature on the electrochromic properties of WO3 grown by LPCVD. Advanced Materials Letters, 9(3), 192-198. doi: 10.5185/amlett.2018.1823
D. Louloudakis; D. Davazoglou;E. Koudoumas; D. Vernardou; G. Papadimitropoulos. "Effect of deposition temperature on the electrochromic properties of WO3 grown by LPCVD". Advanced Materials Letters, 9, 3, 2018, 192-198. doi: 10.5185/amlett.2018.1823
(2018). 'Effect of deposition temperature on the electrochromic properties of WO3 grown by LPCVD', Advanced Materials Letters, 9(3), pp. 192-198. doi: 10.5185/amlett.2018.1823
Effect of deposition temperature on the electrochromic properties of WO3 grown by LPCVD. Advanced Materials Letters, 2018; 9(3): 192-198. doi: 10.5185/amlett.2018.1823
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