Volume 13 (2022)
Volume 12 (2021)
Volume 11 (2020)
Volume 10 (2019)
Volume 9 (2018)
Volume 8 (2017)
Volume 7 (2016)
Volume 6 (2015)
Volume 5 (2014)
Volume 4 (2013)
Volume 3 ( 2012)
Volume 2 (2011)
Volume 1 (2010)
1. Effect of Sulfurization Temperature on RF Sputtered MoS2 Thin Film

V. Thiruvengadam; Braj Bhusan Singh; Palash Kumar Manna; Subhankar Bedanta

Volume 12, Issue 2 , February 2021, , Pages 1-5

Abstract
  Molybdenum disulfide (MoS2) is one among the transition-metal dichalcogenide (TMD) family which exhibits exotic physical properties at their mono-layer limit. We report a facile way to fabricate stoichiometric, crystalline and star shaped MoS2 film. In this work, ultra-thin MoS2 films were fabricated ...  Read More

2. Effect of sulfurization temperature on optical and compositional properties of sputtered Zn(O, S) thin films

K. S. Gour; A. K. Yadav; Rahul Kumar; J. S. Tawale; V. N. Singh

Volume 9, Issue 11 , November 2018, , Pages 811-815

Abstract
  Zinc oxysulfide or Zn(O,S) is emerging as an alternate n-type buffer layer for kesterite, chalcogenides and CdTe based thin film solar cell due to it is being made from non-toxic elements and tunable bandgap, its suitable optical and electrical properties required for a buffer layer. Generally, buffer ...  Read More

3. Synthesis and characterization of sputtered nanostructured ZnO films: Effect of deposition time and pressure on contact angle behavior of ethylene glycol and water

Kartik H. Patel; Sushant K. Rawal

Volume 8, Issue 2 , February 2017, , Pages 101-106

Abstract
  This paper is aimed to explore structural, optical and wettability aspects of zinc oxide (ZnO) nanostructured thin films prepared by radio frequency (RF) magnetron sputtering from a zinc target using gas mixtures of helium and oxygen. The increase of deposition time from 40 to 110 minutes improves evolution ...  Read More

4. Synthesis of nanostructured TiO2 thin films with highly enhanced photocatalytic activity by atom beam sputtering

Jaspal Singh; Kavita Sahu; Sini Kuriakose; Nishant Tripathi; D. K. Avasthi; Satyabrata Mohapatra

Volume 8, Issue 2 , February 2017, , Pages 107-113

Abstract
  Nanostructured TiO2 thin films with highly enhanced photocatalytic activity were prepared by atom beam sputtering technique. The effects of thermal annealing on the structural, morphological and photocatalytic properties of TiO2 thin films were investigated using X-ray diffraction, atomic force microscopy, ...  Read More

5. Structure Dependent Room Temperature Ferromagnetism In Co, Nb Co-doped BaTiO3 Thin Films Prepared By RF Sputtering

R. Siddheswaran; Petr Nov

Volume 7, Issue 6 , June 2016, , Pages 445-448

Abstract
  Thin films of BaTiO3 and Co, Nb co-doped BaTiO3 on glass and Si (100) substrates were deposited by RF sputtering (at 350 ºC), and annealed. The amorphous and crystalline phases were observed for the as-deposited and annealed samples, respectively from the X-ray diffraction (XRD) studies. The magnetic ...  Read More

6. Enhanced Optical Absorbance Of Hydrophobic Ti Thin Film: Role Of Surface Roughness

Jyoti Jaiswal; Manpreet Singh;Ramesh Chandra; Amit Sanger; Ashwani Kumar; Satyendra Mourya; Samta Chauhan; Ritu Daipuriya

Volume 7, Issue 6 , June 2016, , Pages 485-490

Abstract
  In the present work, structural, morphological, optical and wettability properties of DC magnetron sputtered titanium (Ti) thin films have been investigated. The nanostructured Ti thin films were deposited on glass and silicon substrates at various deposition angles, θD = 0°, 30°, 45° ...  Read More

7. Structural, Electrical and Optical Properties Of Molybdenum Doped Zinc Oxide Films Formed By Magnetron Sputtering

R. Subba Reddy; K. Radhamma; A. Sivasankar Reddy; S. Uthanna

Volume 6, Issue 9 , September 2015, , Pages 834-839

Abstract
  Thin films of molybdenum doped (2.7 at.%) zinc oxide (MZO) were deposited on glass substrates held at room temperature by RF magnetron sputtering of mosaic target of Mo-Zn at different substrate bias voltages. The influence of substrate bias voltage on the structural, electrical and optical properties ...  Read More

8.  Electric Field-effect-assisted Persistent Photoconductivity In CZTS

Nadarajah Muhunthan; Om P. Singh; Vidya N. Singh; Kedar N. Sood

Volume 6, Issue 4 , April 2015, , Pages 290-293

Abstract
  Copper zinc tin sulfide (CZTS) thin film was deposited by co-sputtering metal targets and post-deposition sulfurization in H2S. Temperature-dependent electrical conductivity and photoconductivity effects in CZTS are studied. The low temperature electrical conductivity measurement shows acceptor level ...  Read More

9. Swift Heavy Ion Irradiation Induced Surface Sputtering And Micro Structural Modification Of Gold Thin Films

Priyadarshini Dash; Haripriya Rath; Udai B. Singh; Sunil Ojha; Devesh K. Avasthi; Naresh C. Mishra

Volume 6, Issue 4 , April 2015, , Pages 359-364

Abstract
  Two sets of gold thin films of thickness of about 20 and 50 nm, grown by thermal evaporation method on (100) silicon wafers were irradiated by 197 MeV Au ions. Grazing incidence X-Ray diffraction (GIXRD) study has been revealed lattice expansion on decreasing the film thickness. 197 MeV Au ion irradiation ...  Read More

10. Effect Of Annealing Time On The Composition, Microstructure And Band Gap Of Copper Zinc Tin Sulfide Thin Films

Om P. Singh; N. Muhunthan; Vidya N. Singh; Bhanu P. Singh

Volume 6, Issue 1 , January 2015, , Pages 2-7

Abstract
  In this study, CZTS thin films were deposited by co-sputtering Cu, ZnS and SnS targets and sulfurizing it in H2S atmosphere at 550 °C. It has been observed that by varying the sulfurization time from 5 to 40 min, the secondary phases got eliminated and stoichiometric film is obtained. This leads ...  Read More

11. Effect Of Film Thickness On The Structural Morphological And Optical Properties Of Nanocrystalline ZnO Films Formed By RF Magnetron Sputtering

R. Subba Reddy; A. Sreedhar; A. Sivasankar Reddy; S. Uthanna

Volume 3, Issue 3 , July 2012, , Pages 239-245

Abstract
  Zinc oxide (ZnO) thin films were formed by RF reactive magnetron sputtering onto p-type silicon and glass substrates held at room temperature. The thickness of the films deposited was in the range 160 – 398 nm. The thickness dependence structural, morphological and optical properties of ZnO films ...  Read More