Document Type : Research Article
Authors
- Visileanu Emilia 1
- Alexandra Gabriela Ene 1
- Carmen Mihai 1
- Razvan Scarlat 1
- Catalin Grosu 1
- Andreea Ghita 2
1 The National Research and Development Institute for Textile and Leather, 16, Lucretiu Patrascanu Street, Sector 3, Bucharest, Romania
2 National R&D Institute for Non-Ferrous and Rare Metals, Pantelimon, 077145, Romania
Abstract
Physical vapour deposition (EB-PVD) is a well-known technology that is widely used for the deposition of thin films regarding many demands, with a wide range of applications such as conductive textiles. It is a technique in which a high-energy electron beam is used and the metal is deposited on the surface of the substrate in the molecular form under high vacuum conditions. EB-PVD techniques have many advantages, including the high purity, efficiency and ecological nature of the process; the possibility of using substrates mainly in the form of gases and pure metals instead of expensive, complex and usually toxic chemical compounds; the possibility of producing both non-stoichiometric with different properties.
In our research, the development of a primary haemostasis device designed to save the lives of combatants is based on a conductive textile substrate that was achieved by thin film deposition of Cu particles with a hybrid PVD (Physical Vapor Deposition) system, type Torr-Model No: 5X300EB-45KW. A commercial Cu target (99.999%) with a diameter of 2 inches and a thickness of 3 mm was used for deposition. The technological flow of EB-PVD deposition and working parameters for achieving Cu coating were established. The thickness of the deposited layer on textiles was 5µm. The values of electrical conductivity (S/m) obtained on 1 inch of textile surface, were 34.426,67 S/m (V1) and 6.179,15 S/m (V2) and on a 10-inch textile surface, 84.005,38 S/m (V1) and 7.961,02 S/m (V2). SEM analysis of the coated surfaces and semi-quantitative EDS chemical point analysis were performed.
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