Volume 13 (2022)
Volume 12 (2021)
Volume 11 (2020)
Volume 10 (2019)
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Volume 6 (2015)
Volume 5 (2014)
Volume 4 (2013)
Volume 3 ( 2012)
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Comparison between Single Al2O3 or HfO2 Single Dielectric Layers and their Nanolaminated Systems

Raffaella Lo Nigro; Emanuela Schilirò; Patrick Fiorenza; Fabrizio Roccaforte

Volume 11, Issue 1 , January 2020, , Pages 1-5

http://dx.doi.org/10.5185/amlett.2020.011460

Abstract
  Plasma Enhanced Atomic Layer Deposition (PEALD) technique has been used for the fabrication of nanolaminated Al2O3-HfO2 thin films as well as of single Al2O3 and HfO2 layers on silicon substrates. The three different layers, i.e. Al2O3, HO2 and the nanolaminated Al2O3-HfO2 thin films, which consists ...  Read More

Comparison between Single Al2O3 or HfO2 Single Dielectric Layers and their Nanolaminated Systems