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Effect of the substrate bias in diamond deposition during hot filament chemical vapor deposition: Approach by non-classical crystallization 

Jin-Woo Park; Kwang-Ho Kim; Nong-Moon Hwang

Volume 9, Issue 9 , September 2018, , Pages 638-642

https://doi.org/10.5185/amlett.2018.2082

Abstract
  The effect of the substrate bias on the diamond deposition was studied using a hot filament chemical vapor deposition (HFCVD) reactor. Both growth rate of diamonds and sp < sup > 3 /sp < sup > 2 ratio increased with increasing the substrate bias from – 200 V to + 45 V. At + 60 V where ...  Read More

Effect of the substrate bias in diamond deposition during hot filament chemical vapor deposition: Approach by non-classical crystallization