TY - JOUR ID - 15246 TI - Effect of the substrate bias in diamond deposition during hot filament chemical vapor deposition: Approach by non-classical crystallization  JO - Advanced Materials Letters JA - AML LA - en SN - 0976-3961 AU - Park, Jin-Woo AU - Kim, Kwang-Ho AU - Hwang, Nong-Moon AD - Y1 - 2018 PY - 2018 VL - 9 IS - 9 SP - 638 EP - 642 KW - bias KW - diamond film KW - Nanoparticles KW - hot filament cvd KW - Microstructure DO - 10.5185/amlett.2018.2082 N2 - The effect of the substrate bias on the diamond deposition was studied using a hot filament chemical vapor deposition (HFCVD) reactor. Both growth rate of diamonds and sp < sup > 3 /sp < sup > 2 ratio increased with increasing the substrate bias from – 200 V to + 45 V. At + 60 V where the DC glow discharge occurred, however, the data deviated significantly from the tendency. These results were explained by the new concept of non-classical crystallization, where a building block of diamond growth is a charged nanoparticle rather than an atom. Based on the previously reported experimental confirmation of the gas phase generation of negatively-charged diamond nanoparticles, the bias effect on the diamond deposition behavior could be consistently explained. UR - https://aml.iaamonline.org/article_15246.html L1 - https://aml.iaamonline.org/article_15246_2c37ba7a81cc99eaa74f15e7dc24ec9f.pdf ER -