@article { author = {Ishikawa, Ryousuke and Nishida, Hiroki and Fukushima, Hiro and Watanabe, Sho and Yamazaki, Sohei and Oh, Gilgu and Tsuboi, Nozomu}, title = {Graphene micromesh for transparent conductive films applicationĀ }, journal = {Advanced Materials Letters}, volume = {10}, number = {6}, pages = {417-420}, year = {2019}, publisher = {International Association of Advanced Materials}, issn = {0976-3961}, eissn = {0976-397X}, doi = {10.5185/amlett.2019.2238}, abstract = {In order to improve the properties of the graphene transparent conductive film, we developed a process of O2 plasma patterning graphene using a metal mesh as an etching mask. The CVD growth conditions of high-quality multilayer graphene samples consisting of 400 layers or more were found using Ni foil, and the R sheet = 3.4 ± 0.6 Ω/sq. was achieved. The best performance of graphene micromesh based transparent conductive films so far was R sheet = 22.2 Ω/sq. at T = 47.1 ± 1.9 %. According to theoretical calculations based on the combined resistance of the two-dimensional resistance lattice circuit, a combined resistance of 46.8 Ω can be realized at T = 90%.}, keywords = {Patterned graphene,plasma etching,micromesh,transparent conductive films,solar cells}, url = {https://aml.iaamonline.org/article_13865.html}, eprint = {https://aml.iaamonline.org/article_13865_d763234910588c97aaf2bc668f95f7d8.pdf} }