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Effect Of Annealing Temperature On Structural Properties Of nanocrystalline Tl3(PW12O40) Thin Films

S.R. Mane; P.S. Patil;P. N. Bhosale; R. M. Mane

Volume 4, Issue 1 , January 2013, , Pages 94-98

https://doi.org/10.5185/amlett.2013.icnano.117

Abstract
  Thallium (I) doped tungsten heteropolyoxometalate (HPOM) combinatorial thin films have been deposited on glass substrate using simple chemical bath deposition technique. The deposited films were annealed at 100 o C, 150 o C, 200 o C and 250 o C. These annealed thin films were characterized by using SEM, ...  Read More