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Reducing edge effect of temperature-field for large area thin film deposition in hot filament chemical vapor deposition system

Lin Li; Shibing Tian; Ruhao Pan; Chao Wang; Chi Sun; Junjie Li; Changzhi Gu

Volume 9, Issue 10 , October 2018, , Pages 727-732

https://doi.org/10.5185/amlett.2018.2146

Abstract
  The uniformity in temperature-field of the hot filament chemical vapor deposition (HFCVD) system is of great importance since it is a critical parameter that determines the quality of the deposited films. In fact, the temperature-field is mainly filament distribution dependent. In conventional analysis ...  Read More

Reducing edge effect of temperature-field for large area thin film deposition in hot filament chemical vapor deposition system