Deepak Chhikara; K. M. K. Srivatsa; M. Senthil Kumar; Preetam Singh; Sourav Das; O. S. Panwar
Abstract
Vertically well aligned and highly dense ZnO nanowires (NWs) have been grown on biaxially textured Ni substrates by a simple thermal evaporation technique over a large area without using any catalyst. The grown ZnO NWs have crystallized in wurtzite hexagonal structure and have grown along [0001] direction. ...
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Vertically well aligned and highly dense ZnO nanowires (NWs) have been grown on biaxially textured Ni substrates by a simple thermal evaporation technique over a large area without using any catalyst. The grown ZnO NWs have crystallized in wurtzite hexagonal structure and have grown along [0001] direction. It is also observed that the degree of vertical alignment of NWs increases with increasing growth temperature. An intense photoluminescence peak at 383 nm with a negligible deep band emission revealed the good crystalline quality of ZnO NWs. Field emission properties of the grown NWs have been examined and a field enhancement factor of 1573 has been obtained, indicating the suitability of grown nanowires for field emission applications.
K.M.K. Srivatsa; Preetam Singh; Sourav Das
Abstract
Considerable attention has been gained on the deposition of CeO2 thin films with (200) single orientation as hetero-epitaxial buffer layer on (200) oriented biaxially textured flexible Ni substrates, in the fabrication of superconductor and semiconducting epitaxial thin films for device applications. ...
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Considerable attention has been gained on the deposition of CeO2 thin films with (200) single orientation as hetero-epitaxial buffer layer on (200) oriented biaxially textured flexible Ni substrates, in the fabrication of superconductor and semiconducting epitaxial thin films for device applications. In this work we have deposited (200) oriented CeO2 thin films on biaxially textured Ni-W substrate in a single-step process by RF magnetron sputtering, using CeO2 target. X-ray diffraction analysis shows that for the CeO2 thin film deposited at RF sputtering power below 200 W and for the substrate temperature of 700 o C, the film assumes single (200) orientation. For the substrate temperature below 700 o C and RF sputtering powers above 200 W the film shows polycrystalline nature with (111) and (200) orientations. The Raman spectrum of single oriented (200) CeO2 thin film shows only one sharp peak at about 464 cm -1 corresponds to the presence of F2g mode of CeO2. The ellipsometry studies reveal the value refractive index and optical band gap of single oriented film as 2.52 and 3.41 eV, respectively.
Preetam Singh; K. M. K. Srivatsa; Sourav Das
Abstract
Polycrystalline Si (Poly-Si) film with highly crystalline nature, and having most of the grains in the range of 50-100 µm has been grown over biaxially textured Ni-W substrate by Hot-wire chemical vapor deposition technique, using a single buffer layer of CeO2 thin film. This result has been achieved ...
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Polycrystalline Si (Poly-Si) film with highly crystalline nature, and having most of the grains in the range of 50-100 µm has been grown over biaxially textured Ni-W substrate by Hot-wire chemical vapor deposition technique, using a single buffer layer of CeO2 thin film. This result has been achieved for the SiH4 source gas diluted to 95% with added H2 gas, and for the substrate temperature of 840±10oC and a deposition pressure of 40 mTorr. XRD analysis shows that the Poly-Si films have grown with (111) and (200) orientations. Raman studies reveal that a crystalline volume fraction of 95.3% has been achieved. The imaginary part of pseudo dielectric function, <ε2>, as extracted from ellipsometric data, shows two prominent shoulders at energy positions 3.4 eV and 4.2 eV corresponding to the optical absorption of crystalline Si, indicating a high crystallinity of the Poly-Si film. SEM micrograph shows that the grown Poly-Si film is following the morphology and grain size as that of biaxially textured Ni-W substrate. SIMS analysis of the total multilayer structure shows a formation of very sharp interfaces, with no diffusion between Si and Ni, indicating that a single buffer layer of CeO2 is sufficient to avoid the formation of nickel silicide while growing Si over Ni substrate. Thus, these results are very encouraging for the fabrication of Poly-Si film based solar cells with increased efficiency by minimizing the undesired recombination of charge carriers at grain boundaries.