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Graphene micromesh for transparent conductive films application 

Ryousuke Ishikawa; Hiroki Nishida; Hiro Fukushima; Sho Watanabe; Sohei Yamazaki; Gilgu Oh; Nozomu Tsuboi

Volume 10, Issue 6 , June 2019, , Pages 417-420

https://doi.org/10.5185/amlett.2019.2238

Abstract
  In order to improve the properties of the graphene transparent conductive film, we developed a process of O2 plasma patterning graphene using a metal mesh as an etching mask. The CVD growth conditions of high-quality multilayer graphene samples consisting of 400 layers or more were found using Ni foil, ...  Read More

Graphene micromesh for transparent conductive films application