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Room temperature growth of ultra porous hot-wire deposited tantalum pentoxide

Giorgos Papadimitropoulos; Maria Vasilopoulou; Nikos Vourdas; Dimitris N. Kouvatsos; Kostas Giannakopoulos; Stella Kennou; Dimitris Davazoglou

Volume 10, Issue 6 , June 2019, , Pages 395-399

https://doi.org/10.5185/amlett.2019.2283

Abstract
  Tantalum pentoxide films were deposited on Si substrates at room temperature, by heating metallic filaments at temperatures below 600 o C, at a pressure of 1 Torr in O2 environment. This deposition method can be applied for all metallic oxides having higher vapor pressure than the corresponding metal. ...  Read More

Room temperature growth of ultra porous hot-wire deposited tantalum pentoxide