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Effect Of Substrate Temperature On Nanocrystalline CeO2 Thin Films Deposited On Si Substrate By RF Magnetron Sputtering

Preetam Singh; K. M. K. Srivatsa;Sourav Das

Volume 6, Issue 5 , May 2015, , Pages 371-376

https://doi.org/10.5185/amlett.2015.5777

Abstract
  Single oriented nanocrystalline CeO2 thin films have been deposited over Si (100) substrate by RF magnetron sputtering in the temperature range 600-700 o C, using CeO2 target. X-ray diffraction pattern for the as deposited CeO2 film at 700 o C shows the dominant (111) orientation with corresponding FWHM ...  Read More